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Creation of thin-film multilayer structures by magnetron sputtering and their elemental analysis

https://doi.org/10.17586/0021-3454-2025-68-5-417-426

Abstract

The process of formation of a multilayer Al-Ni structure by the magnetron sputtering method used for the reaction of self-propagating high-temperature synthesis is considered. The magnetron sputtering system arrangement is proposed, which allows using six magnetrons and an ion source in a single technological cycle of formation of a multilayer Al-Ni structure, which leads to an increase in the rate of its growth. A sample of the obtained Al-Ni structure is studied using scanning electron microscopy. It is shown that the sample has a thickness of 50 μm, the thickness of one bilayer is 80 nm. The results of studying the obtained structures using Auger spectroscopy and scanning electron microscopy are presented, and an elemental analysis of the formed multilayer structure is carried out.

About the Authors

D. E. Shashin
Volga State University of Technology
Russian Federation

Dmitry Е. Shashin — PhD, Associate Professor, Department of Radio Equipment Design and Production; Associate Professor

Yoshkar-Ola



N. I. Sushentsov
Volga State University of Technology
Russian Federation

Nikolay I. Sushentsov — PhD, Associate Professor, Department of Radio Equipment Design and Production; Head of the Department

Yoshkar-Ola



A. D. Dyachkov
Volga State University of Technology
Russian Federation

Alexey D. Dyachkov — Post-Graduate Student, Department of Radio Equipment Design and Production

Yoshkar-Ola



A. L. Romanov
Volga State University of Technology
Russian Federation

Alexey L. Romanov — Masterʼs Student, Department of Radio Equipment Design and Production

Yoshkar-Ola



K. A. Volkov
Volga State University of Technology
Russian Federation

Кirill A. Volkov — Post-Graduate Student, Department of Radio Equipment Design and Production

Yoshkar-Ola



P. G. Gabdullin
Peter the Great St. Petersburg Polytechnic University
Russian Federation

Pavel G. Gabdullin — PhD, Associate Professor, Higher School of Engineering and Physics, Institute of Electronics and Telecommunications

St. Petersburg



O. E. Kvashenkina
SNDGroup
Russian Federation

Olga Е. Kvashenkina — PhD, Associate Professor; General Manager

St. Petersburg



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Review

For citations:


Shashin D.E., Sushentsov N.I., Dyachkov A.D., Romanov A.L., Volkov K.A., Gabdullin P.G., Kvashenkina O.E. Creation of thin-film multilayer structures by magnetron sputtering and their elemental analysis. Journal of Instrument Engineering. 2025;68(5):417-426. (In Russ.) https://doi.org/10.17586/0021-3454-2025-68-5-417-426

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ISSN 0021-3454 (Print)
ISSN 2500-0381 (Online)